POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN,申请号EP20020788696-传众专利搜索

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发明名称	POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
摘要
申请公布号	EP1452918(A4)	申请公布日期	2008.11.05
申请号	EP20020788696	申请日期	2002.11.29
申请人	TOKYO OHKA KOGYO CO., LTD.	发明人	IWAI, TAKESHI;KUBOTA, NAOTAKA;FUJIMURA, SATOSHI;HADA, HIDEO
分类号	C08F220/18;C08F220/28;G03F7/039;H01L21/027;(IPC1-7):G03F7/039	主分类号	C08F220/18
代理机构		代理人
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