发明名称 |
Apparatus and method of forming a photoresist pattern, and repair nozzle |
摘要 |
In an apparatus and a method of forming a photoresist pattern, a photoresist-coating section coats a substrate with a photoresist composition to form a photoresist film. A light is irradiated onto the photoresist film by using an exposure section, and a developing section develops the photoresist film. A residue-sensing section senses a residue of the developed photoresist film to generate information of the residue corresponding to the sensed residue. A residue-removing section sprays a solvent in a region of the residue corresponding to the information of the residue to dissolve the residue, and the residue-removing section absorbs the residue dissolved by the solvent. Therefore, the residue is effectively removed by spraying the solvent in the region of the residue and absorbing the residue dissolved by the solvent.
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申请公布号 |
US7447559(B2) |
申请公布日期 |
2008.11.04 |
申请号 |
US20040960192 |
申请日期 |
2004.10.06 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOON GI-CHEON;AN GEUN-SOO |
分类号 |
G03D3/00;H01L21/027;G03F7/00;G03F7/30 |
主分类号 |
G03D3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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