发明名称 INTEGRATED CIRCUIT ISOLATION SYSTEM
摘要 <p>Integrated Circuit Isolation System Disclosed herein is a method of manufacturing a self-aligned inverted T- shaped isolation structure. A method of manufacturing an integrated circuit isolation system (100) includes providing a substrate (202), forming a base insulator region (702) in the substrate (202), and depositing an insulator column (1102) having a narrower width than the base insulator region (702) on the base insulator region (702).</p>
申请公布号 SG146480(A1) 申请公布日期 2008.10.30
申请号 SG20070022635 申请日期 2007.03.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;CHARTERED SEMICONDUCTOR MANUFACTURING LTD 发明人 CHONG YUNG FU;LUO ZHIJIONG
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