| 摘要 |
PROBLEM TO BE SOLVED: To provide a sample manufacturing method for separating a minute sample containing a desired region from a sample such as an electronic component or the like, for example, a semiconductor wafer or device without inclining a sample stage to perform the analysis or observation of a minute region, and a sample manufacturing apparatus. SOLUTION: The surface of the sample is irradiated with a condensed ion beam at an irradiation angle of below 90°to remove the target periphery of a minute sample and the sample stage is subsequently rotated on the segment vertical to the surface of the sample. The irradiation angle of the condensed ion beam to the surface of the sample is fixed to irradiate the sample to separate the minute sample. COPYRIGHT: (C)2009,JPO&INPIT
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