发明名称 |
Positive resist compositions and patterning process |
摘要 |
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. The acid generator (B) is a specific sulfonium salt compound. When processed by lithography, the composition is improved in resolution, and forms a pattern with a minimal line edge roughness.
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申请公布号 |
US2008268370(A1) |
申请公布日期 |
2008.10.30 |
申请号 |
US20070984608 |
申请日期 |
2007.11.20 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
TANAKA SHIGEO;SEKI AKIHIRO;TAKEMURA KATSUYA;NISHI TSUNEHIRO |
分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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