发明名称 Structure for Electrostatic Discharge in Embedded Wafer Level Packages
摘要 A workpiece has at least two semiconductor chips, each semiconductor chip having a first main surface, which is at least partially exposed, and a second main surface. The workpiece also comprises an electrically conducting layer, arranged on the at least two semiconductor chips, the electrically conducting layer being arranged at least on regions of the second main surface, and a molding compound, arranged on the electrically conducting layer.
申请公布号 US2008265421(A1) 申请公布日期 2008.10.30
申请号 US20070746936 申请日期 2007.05.10
申请人 INFINEON TECHNOLOGIES AG 发明人 BRUNNBAUER MARKUS;MEYER THORSTEN;BRADL STEPHAN;PLIENINGER RALF
分类号 H01L23/52;H01L21/4763;H01L23/552 主分类号 H01L23/52
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