发明名称 METHOD FOR FABRICATING PLASMA REACTOR PARTS
摘要 <p>METHOD FOR FABRICATING PLASMA REACTOR PARTS A method of fabricating silicon parts are provided herein. The method includes growing a silicon sample, machining the sample to form a part, and annealing the part by exposing the part sequentially to one or more gases. Process conditions during silicon growth and post-machining anneal are designed to provide silicon parts that are particularly suited for use in corrosive environments.</p>
申请公布号 SG146548(A1) 申请公布日期 2008.10.30
申请号 SG20080019036 申请日期 2008.03.07
申请人 APPLIED MATERIALS, INC. 发明人 RYABOVA ELMIRA;YUAN JIE;SUN JENNIFER
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