发明名称 Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
摘要 A ceramic article which is resistant to erosion by halogen-containing plasmas used in semiconductor processing. The ceramic article includes ceramic which is multi-phased, typically including two phase to three phases. The ceramic is formed from yttrium oxide at a molar concentration ranging from about 50 mole % to about 75 mole %; zirconium oxide at a molar concentration ranging from about 10 mole % to about 30 mole %; and at least one other component, selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof, at a molar concentration ranging from about 10 mole % to about 30 mole %.
申请公布号 US2008264565(A1) 申请公布日期 2008.10.30
申请号 US20070796211 申请日期 2007.04.27
申请人 APPLIED MATERIALS, INC. 发明人 SUN JENNIFER Y.;DUAN REN-GUAN;YUAN JIE;XU LI;COLLINS KENNETH S.
分类号 C04B35/48;C23C16/22;H01L21/3065 主分类号 C04B35/48
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