发明名称 |
VERTICAL HEAT TREATMENT APPARATUS, AND CARRYING METHOD FOR SUBSTRATE TO BE TREATED |
摘要 |
A vertical heat treatment apparatus and a carrying method for a substrate to be treated are provided to transport plural substrates by using a supporting plate with a cutout part through which a mounting board passes up and down. A vertical heat treatment apparatus(1) comprises a thermal process furnace(3); a covering unit(6); a retainer(9) equipped at the covering unit and retaining the plural substrates with a ring type supporting plate(15); an elevating unit(11) moving up and down the covering unit in order to take in and out the retainer; a container(16) containing the substrates to be treated and securing a constant distance; a mounting board(20) for containing substrates to be treat; an outer supporting plate including a cutout part through which the mounting board passes up and down; an inner supporting plate including a chock blocking part for chock-blocking the cutout part. |
申请公布号 |
KR20080095781(A) |
申请公布日期 |
2008.10.29 |
申请号 |
KR20080037480 |
申请日期 |
2008.04.23 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HAGIHARA JUNICHI |
分类号 |
H01L21/324;H01L21/22;H01L21/677 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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