发明名称 |
Grayscale reticle for precise control of photoresist exposure |
摘要 |
A method of fabricating a grayscale reticule includes preparing a quartz substrate; depositing a layer of silicon-rich oxide on the quartz substrate; depositing a layer of silicon nitride as an oxidation barrier layer on the silicon-rich oxide layer; depositing and patterning a layer of photoresist; etching the silicon nitride layer with a pattern for the silicon nitride layer; removing the photoresist; cleaning the quartz substrate and the remaining layers; oxidizing the quartz substrate and the layers thereon, thereby converting the silicon-rich oxide layer to a transparent silicon dioxide layer; removing the remaining silicon nitride layer; forming the quartz substrate and the silicon dioxide thereon into a reticule; and using the reticule to pattern a microlens array.
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申请公布号 |
US7439187(B2) |
申请公布日期 |
2008.10.21 |
申请号 |
US20060588891 |
申请日期 |
2006.10.27 |
申请人 |
SHARP LABORATORIES OF AMERICA |
发明人 |
ONO YOSHI;ULRICH BRUCE D.;JOSHI POORAN CHANDRA |
分类号 |
H01L21/00;H01L21/302 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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