发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM FORMING METHOD USING THE SAME
摘要 <p>A positive photosensitive resin composition, includes: (A) a resin containing an acid-dissociable group having a specific acetal structure as defined in the specification, which is alkali-insoluble or sparingly alkali-soluble and becomes alkali-soluble when the acid-dissociable group is dissociated; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a crosslinking agent; and (D) an adhesion aid, and a cured film forming method uses the same.</p>
申请公布号 WO2008123563(A1) 申请公布日期 2008.10.16
申请号 WO2008JP56626 申请日期 2008.03.27
申请人 FUJIFILM CORPORATION;TAKITA, SATOSHI 发明人 TAKITA, SATOSHI
分类号 G03F7/039;G03F7/004;G03F7/075;G03F7/40 主分类号 G03F7/039
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