| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can satisfactorily supply a chemical solution into the opening of a processing cup. SOLUTION: During the supply of a first chemical solution, a CPU 61 monitors a detected value output from a revolution sensor 16 (step S7). Next, when the detected value outputted from the revolution sensor 16 goes out of the range of revolutions (NO in step S7), the CPU 61 closes a first chemical solution surface valve 23, inhibits the opening of the valve thereafter (step S9), and outputs an alarm indicating the inhibition of the opening of the valve (step S10); and then the interlocking operation is completed. COPYRIGHT: (C)2009,JPO&INPIT
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