发明名称 LASER ANNEALING APPARATUS AND LASER ANNEALING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a laser annealing apparatus that reduces the unevenness in pitch to be generated in annealing treatment, and has a simple configuration and high versatility, and also to provide a method for the laser annealing device. SOLUTION: A laser annealing apparatus and laser annealing method is provided. The laser annealing apparatus comprises: a laser oscillator; a beam forming means that is provided in the optical path of a generated laser beam so as to form the laser beam into a linear profile; and a treatment chamber provided with a placing table for supporting an object to be laser annealed in a position to be irradiated with the formed laser beam. In the laser annealing apparatus, a birefringent crystal is disposed in the optical path of the laser beam so as to split the laser beam which enters the birefringent crystal in the focusing direction of the laser beam. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008252064(A) 申请公布日期 2008.10.16
申请号 JP20070320998 申请日期 2007.12.12
申请人 ULVAC JAPAN LTD 发明人 ONISHI YOSHINORI;IKEDA HITOSHI;YAMAMOTO YOSHIAKI;MORIMURA TARO;TAMAGAWA KOICHI
分类号 H01L21/268;H01L21/20 主分类号 H01L21/268
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