发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE TRANSFER MATERIAL, PIXEL BARRIER AND METHOD FOR FORMING THE SAME, SUBSTRATE WITH PIXEL BARRIER, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, AND DISPLAY DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is suppressed in emission of a fluorine-containing compound component during a heat treatment, and to provide a photosensitive transfer material. <P>SOLUTION: The photosensitive resin composition contains an initiator, an ethylenically unsaturated compound and a fluorine-containing compound, wherein the heat reduction rate of the fluorine-containing compound when it is kept at 150°C for 30 minutes is not more than 30%. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008250102(A) |
申请公布日期 |
2008.10.16 |
申请号 |
JP20070092892 |
申请日期 |
2007.03.30 |
申请人 |
FUJIFILM CORP |
发明人 |
KASHIWAGI DAISUKE;ARIOKA DAISUKE |
分类号 |
G03F7/004;G02B5/20;G03F7/032 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|