发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE TRANSFER MATERIAL, PIXEL BARRIER AND METHOD FOR FORMING THE SAME, SUBSTRATE WITH PIXEL BARRIER, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, AND DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which is suppressed in emission of a fluorine-containing compound component during a heat treatment, and to provide a photosensitive transfer material. <P>SOLUTION: The photosensitive resin composition contains an initiator, an ethylenically unsaturated compound and a fluorine-containing compound, wherein the heat reduction rate of the fluorine-containing compound when it is kept at 150&deg;C for 30 minutes is not more than 30%. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008250102(A) 申请公布日期 2008.10.16
申请号 JP20070092892 申请日期 2007.03.30
申请人 FUJIFILM CORP 发明人 KASHIWAGI DAISUKE;ARIOKA DAISUKE
分类号 G03F7/004;G02B5/20;G03F7/032 主分类号 G03F7/004
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