发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a semiconductor element which has an excellent high-speed responsiveness with a small specific inductive capacity in an insulating film, and also has an excellent mechanical strength in the insulating film, and a high reliability in a wiring. <P>SOLUTION: In a manufacturing method of the semiconductor element having the step of forming a cavity 3 in a film 2, this method has the irradiation step of, after the cavity 3 is formed, irradiating an electromagnetic energy on the film 2 formed with the cavity. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008251858(A) 申请公布日期 2008.10.16
申请号 JP20070091733 申请日期 2007.03.30
申请人 CONSORTIUM FOR ADVANCED SEMICONDUCTOR MATERIALS &RELATED TECHNOLOGIES 发明人 ANDO YASUTO
分类号 H01L21/3205;H01L21/312;H01L21/314 主分类号 H01L21/3205
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