发明名称 SUBSTRATE TRANSFER METHOD AND APPARATUS, AND EXPOSURE METHOD AND DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To reduce the warpage of a substrate during the transfer even when the substrate is easily warped. <P>SOLUTION: In a wafer W transfer system for transferring a wafer onto a wafer holder 8, there are provided center pins 9 whose tips being to be inserted into and through openings in the wafer holder 8, auxiliary pins 10A-10C arranged to surround the center pins 9 and to be inserted into and through openings in the wafer holer 8, a moving up/down drive unit 16 for moving up/down the center pins 9, and a support member 18 for coupling the auxiliary pins 10A-10C to the center pins 9 so that when the center pins 9 are moved up and the wafer W is mounted on the center pins 9, the wafer W is also mounted on the auxiliary pins 10A-10C. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008251754(A) 申请公布日期 2008.10.16
申请号 JP20070089945 申请日期 2007.03.29
申请人 NIKON CORP 发明人 NARUSHIMA HIROAKI
分类号 H01L21/683;G03F7/20;H01L21/027;H01L21/677 主分类号 H01L21/683
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