发明名称 Embossing Device with a Deflection Compensated Roller
摘要 A diffractive microstructure is produced on the surface layer of a substrate using an embossing device. The embossing device includes an embossing roll and a backing roll for exerting an embossing pressure on the surface layer of the substrate. The embossing pressure and/or variations in temperature cause deflection of the embossing roll. To compensate for the deflection, the embossing device can set the embossing pressure exerted by the central area of the embossing roll on the surface layer of the substrate to be at least equal to or higher than the embossing pressure exerted by the end areas of the embossing roll on the surface layer of the substrate.
申请公布号 US2008251956(A1) 申请公布日期 2008.10.16
申请号 US20050660053 申请日期 2005.08.05
申请人 AVANTONE OY 发明人 KORHONEN RAIMO;KOIVUKUNNAS PEKKA
分类号 B29D11/00;B31F1/07;B81C;F16C;F16C13/00 主分类号 B29D11/00
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