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经营范围
发明名称
Lithographic projection apparatus and reflector asembly for use in said apparatus
摘要
申请公布号
EP1389747(B1)
申请公布日期
2008.10.15
申请号
EP20030077572
申请日期
2003.08.15
申请人
ASML NETHERLANDS B.V.
发明人
BAKKER, LEVINUS PIETER;JONKERS, JEROEN;SCHUURMANS, FRANK JEROEN PIETER;VISSER, HUGO MATTHIEU
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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