| 摘要 |
A wafer that is less susceptible to chipping or peeling during a sawing process is disclosed. The wafer includes a plurality of chips, scribe lanes formed between the plurality of chips, and a passivation film, which is formed on the plurality of chips and the scribe lanes and has a plurality of perforations, e.g. slit patterns engraved on each scribe lane. A photolithography reticle and method of manufacturing the wafer are also provided. |
