METHOD FOR PATTERNING METAL LINE IN SEMICONDUCTOR DEVICE,申请号KR20060061444-传众专利搜索

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发明名称	METHOD FOR PATTERNING METAL LINE IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100862313(B1)	申请公布日期	2008.10.13
申请号	KR20060061444	申请日期	2006.06.30
申请人		发明人
分类号	H01L21/28;H01L21/027	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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