发明名称 FIELD EFFECT SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the problem that it is difficult to obtain an HEMT having a high breakdown voltage and low on-resistance. SOLUTION: The HEMT has: an electron running layer 4; an electron supply layer 5 arranged on the electron running layer 4; a source electrode 6; a drain electrode 7; a gate electrode 8; a gate field plate 12; a source field plate 13; and first and second insulation films 9, 10. A ratio L<SB>GF</SB>/L<SB>GFD</SB>of length L<SB>GF</SB>in the gate field plate to a distance L<SB>GFD</SB>between the edge at the side of the drain electrode of the gate field plate 12 and the drain electrode 8 is set to 1-70%. A ratio L<SB>SF</SB>/L<SB>GFD</SB>of a distance L<SB>SF</SB>between the edge at the side of the drain electrode of the source field plate 13 that of the gate field plate 12 to a distance L<SB>GFD</SB>between the edge at the side of the drain electrode of the gate field plate 12 and the drain electrode 8 is set to a range of 1-60%. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008244002(A) 申请公布日期 2008.10.09
申请号 JP20070080094 申请日期 2007.03.26
申请人 SANKEN ELECTRIC CO LTD 发明人 KANEKO NOBUO;BABA RYOHEI
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
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