发明名称 Method of manufacturing thin film transistor
摘要 Disclosed is a method of manufacturing a thin film transistor, in which a semiconductor layer and a gate insulating film may be formed through ink jet printing using a single bank, thereby simplifying the manufacturing process and decreasing the manufacturing cost, leading to more economical thin film transistors. The thin film transistor manufactured using the method of example embodiments may be used as a switching element for sensors, memory devices, optical devices, and active matrix flat panel displays.
申请公布号 US2008246089(A1) 申请公布日期 2008.10.09
申请号 US20080078693 申请日期 2008.04.04
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KO ICK HWAN;KEE IN SEO;LEE YOUNG GU;SHIM HONG SHIK
分类号 H01L51/30;H01L29/786;H01L51/40 主分类号 H01L51/30
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