STABILIZING A SUBSTRATE USING A VACUUM PRELOAD AIR BEARING CHUCK

摘要

Substrate processing method and apparatus are disclosed. The apparatus includes a chuck having a surface with one or more gas flow openings configured to provide a flow of gas to the surface. The surface includes one or more vacuum channels distributed across the surface. The vacuum channels permit vacuum to be drawn therethrough. In the method a substrate may be supported proximate the chuck surface with a back surface of the substrate sufficiently close to the chuck surface that a flow of gas and vacuum can maintain the substrate back surface and the chuck surface in a spaced-apart relationship. Gas flow is provided to the chuck surface through the gas flow openings and vacuum is drawn through one or more vacuum channels. The substrate is moved along a direction substantially perpendicular to the surface of the substrate.