| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus which can prevent poor drying resulting from deionized water by reducing a concentration of the deionized water in a solvent as much as possible. SOLUTION: A control section 97 performs substitution treatment to substitute the deionized water with the solvent by injecting the solvent after deionized water cleaning to clean a substrate W with the deionized water, the flow of a treatment fluid is switched to first branch piping 49, after separation and removal treatment to remove the deionized water from the processing fluid by an oil water separating filter 51, the flow of the treatment fluid is switched to second branch piping 53, absorption/removal treatment is performed by an absorption filter 55. Accordingly, it is possible to absorptively remove by the absorption filter 55 only the deionized water of a minute amount which cannot be removed even by the separation and removal treatment, and is possible to make a deionized water concentration in the solvent low as much as possible. As the result, the poor drying resulting from the deionized water in the solvent can be prevented. COPYRIGHT: (C)2009,JPO&INPIT
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