| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor and a substrate processing method, with which occurrence of a drying failure is prevented when a face to be processed of a substrate that gets wet by liquid is dried and the face to be processed of the substrate can sufficiently be dried. SOLUTION: Dry gas is introduced into an interval space SP from a state where the interval space SP between a lower face 31 of a guide member 3 and a substrate surface Wf is densely filled with rinse liquid. Thus, air bubbles 21 occur in a center of the interval space SP, and the air bubbles 21 are expanded. Thus, a vapor-liquid interface expands in a radial direction. The lower face 31 of the guide member 3 is formed in an almost symmetrical shape around a center axis J of the substrate W, and it is brought close to the substrate W as it goes toward a peripheral edge. Consequently, the air bubbles 21 can be expanded along the radial direction while an automatic aligning operation is performed on the air bubbles 21 caused in the interval space SP. The vapor-liquid interface can concentrically be expanded along the radial direction. COPYRIGHT: (C)2009,JPO&INPIT
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