发明名称 |
CONTROLLING PLASMA PROCESSING USING PARAMETERS DERIVED THROUGH THE USE OF A PLANAR ION FLUX PROBING ARRANGEMENT |
摘要 |
Methods and apparatus for detecting and/or deriving the absolute values of and/or the relative changes in parameters such as the plasma potential and the ion flux using a Planar Ion Flux (PIF) probing arrangement are disclosed. The detected and/or derived values are then employed to control plasma processing processes. |
申请公布号 |
WO2007121087(B1) |
申请公布日期 |
2008.10.02 |
申请号 |
WO2007US65890 |
申请日期 |
2007.04.03 |
申请人 |
LAM RESEARCH CORPORATION;KEIL, DOUGLAS |
发明人 |
KEIL, DOUGLAS |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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