发明名称 SCHOTTKY BARRIER DIODE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>A Schottky barrier diode is provided with an epitaxially grown layer, which is formed on a substrate and has a mesa section, and a Schottky electrode formed on the mesa section. A distance between an end section of the Schottky electrode and an upper surface end section of the mesa section is 2µm or shorter. With a distance (x) of 2µm or shorter, the Schottky barrier diode having a remarkably reduced leak current, an improved breakdown voltage and excellent withstand voltage characteristics is provided.</p>
申请公布号 WO2008117718(A1) 申请公布日期 2008.10.02
申请号 WO2008JP55089 申请日期 2008.03.19
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;MIYAZAKI, TOMIHITO;KIYAMA, MAKOTO 发明人 MIYAZAKI, TOMIHITO;KIYAMA, MAKOTO
分类号 H01L29/47;H01L29/872 主分类号 H01L29/47
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