发明名称 |
SCHOTTKY BARRIER DIODE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>A Schottky barrier diode is provided with an epitaxially grown layer, which is formed on a substrate and has a mesa section, and a Schottky electrode formed on the mesa section. A distance between an end section of the Schottky electrode and an upper surface end section of the mesa section is 2µm or shorter. With a distance (x) of 2µm or shorter, the Schottky barrier diode having a remarkably reduced leak current, an improved breakdown voltage and excellent withstand voltage characteristics is provided.</p> |
申请公布号 |
WO2008117718(A1) |
申请公布日期 |
2008.10.02 |
申请号 |
WO2008JP55089 |
申请日期 |
2008.03.19 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD.;MIYAZAKI, TOMIHITO;KIYAMA, MAKOTO |
发明人 |
MIYAZAKI, TOMIHITO;KIYAMA, MAKOTO |
分类号 |
H01L29/47;H01L29/872 |
主分类号 |
H01L29/47 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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