| 摘要 |
PROBLEM TO BE SOLVED: To prevent an object layer in an effective region from being overexposed as irradiation light for periphery exposure is reflected by a stage. SOLUTION: A peripheral exposure device is a device for exposing a resist layer 7 as the object layer formed in a peripheral region 22 of a translucent substrate 4 having the effective region 21 occupying a center portion and the peripheral region 22 occupying an outer-edge periphery, and has a light source 2 to irradiate the peripheral region 22 with parallel light 6 perpendicularly to a surface of the substrate 4; the stage 1 which is disposed on the opposite side from the light source 2 with respect to the substrate 4 and has a photodetection surface 1a extending in a region including a region formed by projecting the substrate 4 in a perpendicular direction of the substrate 4, a light reflecting portion 9 being provided in a region formed by projecting the peripheral region 22 of the photodetection surface 1a in the perpendicular direction of the substrate 4; and a support pin 5 as a support portion for supplying the substrate 4 almost in parallel to the photodetection surface 1a. The light reflecting portion 9 has a slope 9a directed to outside the substrate 4. COPYRIGHT: (C)2009,JPO&INPIT
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