| 摘要 |
A micro movable device, a wafer, and a method for manufacturing a wafer are provided to increase a yield of a gyro sensor by forming a fine rough region for suppressing a sticking effect. A micro movable device(X1) is obtained by processing a material substrate of a multilayer structure including a first layer, a second layer having a fine rough surface on the first layer, and an intermediate layer positioned between the first layer and the second layer. The micro movable device includes a first structure(62A,62B) and a second structure(61). The first structure is formed in the first layer. The second structure is formed in the second layer. The second layer is displaceable relatively to the first structure. The second structure faces the first structure by forming a gap therebetween. The second structure has a finely rough region on a side of the first structure.
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