| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of suppressing viscosity reduction over time and capable of stably forming a thick film resist pattern, a resist pattern forming method and a touch panel device including a resist pattern formed using the resist pattern forming method as a spacer. <P>SOLUTION: The photosensitive resin composition comprises (A) an acrylic resin, (B) a monomer having an ethylenically unsaturated group, (C) a photopolymerization initiator and (D) a solvent which is dissolved in 100 g of water at 25°C in an amount of ≥20 g. The resist pattern is obtained as follows; the photosensitive resin composition is applied on a support, dried, subjected to predetermined pattern exposure and developed. <P>COPYRIGHT: (C)2009,JPO&INPIT |
