发明名称 PROCESS FOR MANUFACTURING A COMPOSITE SUBSTRATE
摘要 <p>The invention relates to a process for manufacturing a composite substrate comprising bonding a first substrate (10) onto a second semi-conducting substrate (30), characterised in that it includes, before bonding, the formation of a bonding layer (20) between the first and the second substrate, said bonding layer (20) comprising a plurality of islands (21) distributed over the surface of the first substrate (10) in a determined pattern and separated from one another by regions (22) of a different type, which are distributed in a complementary pattern, wherein said islands (21) are formed via a plasma treatment of the material of the first substrate (10).</p>
申请公布号 WO2008116879(A1) 申请公布日期 2008.10.02
申请号 WO2008EP53563 申请日期 2008.03.26
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES;ALLIBERT, FREDERIC;KERDILES, SEBASTIEN 发明人 ALLIBERT, FREDERIC;KERDILES, SEBASTIEN
分类号 H01L21/762;H01L21/68 主分类号 H01L21/762
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