发明名称 |
PROCESS FOR MANUFACTURING A COMPOSITE SUBSTRATE |
摘要 |
<p>The invention relates to a process for manufacturing a composite substrate comprising bonding a first substrate (10) onto a second semi-conducting substrate (30), characterised in that it includes, before bonding, the formation of a bonding layer (20) between the first and the second substrate, said bonding layer (20) comprising a plurality of islands (21) distributed over the surface of the first substrate (10) in a determined pattern and separated from one another by regions (22) of a different type, which are distributed in a complementary pattern, wherein said islands (21) are formed via a plasma treatment of the material of the first substrate (10).</p> |
申请公布号 |
WO2008116879(A1) |
申请公布日期 |
2008.10.02 |
申请号 |
WO2008EP53563 |
申请日期 |
2008.03.26 |
申请人 |
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES;ALLIBERT, FREDERIC;KERDILES, SEBASTIEN |
发明人 |
ALLIBERT, FREDERIC;KERDILES, SEBASTIEN |
分类号 |
H01L21/762;H01L21/68 |
主分类号 |
H01L21/762 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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