| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflection film with high chemical resistance, in which crosslinking of an interface adjacent to a high refractive index layer (especially, crosslinking of an interface between the adjacent low-refractive index layer and the high refractive index layer) is enhanced, physical strength such as contactness, abrasion resistance is raised and further more, the physical strength is not impaired, even when saponification processing is performed. <P>SOLUTION: The antireflection film is used, in which there is the high refractive index layer, containing metal alkoxide having an ethylenically unsaturated group on a transparent support, the content of Ti and/or Zr per gram for solid content of the high refractive index layer is at least 2.0 millimoles; furthermore, the low refractive index layer containing fluorine-containing compound, having silica fine particles and the ethylenically unsaturated group as major components, is formed on the high refractive index layer and which is cured through heat and UV irradiation. <P>COPYRIGHT: (C)2009,JPO&INPIT |
