| 摘要 |
PROBLEM TO BE SOLVED: To solve the problems of a barrier towards efficient circuit development and testing caused by a specially designed mask controlling the arrangement of conductive materials that form the source and the drain of a transistor, and wherein designing the mask can possibly be costly and time-consuming, which means that the testing of a circuit involving a transistor can also be costly and time-consuming. SOLUTION: The present invention provides a general-purpose pattern comprising a large number of aligned conductive islands. The pattern is used as a source and a drain terminal for the formation of a thin-film transistor and as a conductive source for the formation of other electronic components on a large number of conductive islands aligned. COPYRIGHT: (C)2009,JPO&INPIT |
