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发明名称
Herstellungsverfahren für eine Transistor-Gatestruktur
摘要
申请公布号
DE102006053930(B4)
申请公布日期
2008.10.02
申请号
DE200610053930
申请日期
2006.11.15
申请人
QIMONDA AG
发明人
FITZ, CLEMENS;BUERKE, AXEL;HAHN, JENS;JAKUBOWSKI, FRANK;MONO, TOBIAS;REGUL, JOERN;SCHMIDBAUER, SVEN
分类号
H01L21/336
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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