LOW TEMPERATURE POLYCRYSTALLINE GROWTH

摘要

A low-temperature polycrystalline growth method is provided to enhance process efficiency by forming a polycrystalline thin film without performing an additional thermal process. A vacuum deposition process is performed to deposit Au on an upper surface of a substrate(110) to form an Au thin film(130) by crystallizing the Au. An upper thin film deposition process is performed to deposit a conductive material or a semiconducting material on an upper surface of the Au thin film in a vacuum deposition method. The deposited conductive material or the deposited semiconducting material are grown according to a shape corresponding to a crystalline structure of the crystallized Au thin film to form an upper thin film(140) of a crystalline state.