PATTERN CORRECTION APPARATUS AND PATTERN CORRECTION METHOD

摘要

A pattern correction apparatus and a method thereof are provided to correct an electrode breaking part or the like through a thin line of about 10‘í by using a film as a mask. A film supply unit refolds a band shaped film(3) to be disposed up and down, and supplies the film to an upper side of a substrate(1). A moving unit moves a part of an upper film of the film to expose a mask pattern formed in a lower film. Each mask pattern has at least one through hole(3a) as being formed in a shape corresponding to a defect part(2a). A location determining unit makes the mask pattern face the defect part as leaving a space for a predetermined gap. An applying unit(9) presses the lower film onto the substrate within a predetermined range including the hole, and applies correction paste(10) to the defect part through the mask pattern.