发明名称 |
Method of forming a pattern, method of forming wiring, semiconductor device, TFT device, electro-optic device, and electronic instrument |
摘要 |
A method of forming a pattern of a functional layer on a surface of a substrate, where a pattern region, to which the pattern is provided, is edged with a boundary layer, and has a first region and a second region communicated with the first region and having a narrower width than the first region, the method includes: providing an intermediate layer having adhesiveness with the substrate and lyophilicity with a functional fluid to the first and the second regions; ejecting a droplet of the functional fluid to the first region; and allowing the droplet of the functional fluid ejected to the first region to automatically flow to the second region with the lyophilicity with the intermediate layer.
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申请公布号 |
US7429530(B2) |
申请公布日期 |
2008.09.30 |
申请号 |
US20050232328 |
申请日期 |
2005.09.21 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
MORIYA KATSUYUKI;HIRAI TOSHIMITSU |
分类号 |
H01L21/44 |
主分类号 |
H01L21/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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