发明名称 Method of forming a pattern, method of forming wiring, semiconductor device, TFT device, electro-optic device, and electronic instrument
摘要 A method of forming a pattern of a functional layer on a surface of a substrate, where a pattern region, to which the pattern is provided, is edged with a boundary layer, and has a first region and a second region communicated with the first region and having a narrower width than the first region, the method includes: providing an intermediate layer having adhesiveness with the substrate and lyophilicity with a functional fluid to the first and the second regions; ejecting a droplet of the functional fluid to the first region; and allowing the droplet of the functional fluid ejected to the first region to automatically flow to the second region with the lyophilicity with the intermediate layer.
申请公布号 US7429530(B2) 申请公布日期 2008.09.30
申请号 US20050232328 申请日期 2005.09.21
申请人 SEIKO EPSON CORPORATION 发明人 MORIYA KATSUYUKI;HIRAI TOSHIMITSU
分类号 H01L21/44 主分类号 H01L21/44
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