HIGH PHOTOSENSITIVE PHOTOPOLYMERS VIA INTRODUCING THE PHOTOPOLYMERIZABLE MOLECULAR-SIZED INORGANIC UNITS

摘要

A photopolymer composition is provided to solve the light scattering problem occurring in a conventional photopolymer using nanoparticles, to obtain high photosensitivity and high-density crosslinked structure, and to inhibit shrinkage of the volume of an inorganic nanoblock. A photopolymer composition comprises: a polymer matrix containing a molecular sized inorganic material having photoreactivity; a photopolymerizable monomer; an initiator; a photosensitizer; and a plasticizer. The molecular sized inorganic material having photoreactivity includes polyhedral oligomeric silsesquioxane(POSS). The photopolymer composition comprises: 50-65 wt% of the polymer matrix; 20-35 wt% of the photopolymerizable monomer; 0.5-3 wt% of POSS; 10-20 wt% of the plasticizer; and the balance amount of the initiator.