Plasma species and uniformity control through pulsed VHF operation

摘要

An apparatus for processing a substrate has a chamber (102), a high frequency power source (116), and a low frequency power source (118). The chamber has a first (104) and second (106) electrode disposed therein. The high frequency power source is electrically coupled to either the first or second electrode to supply a first RF signal. The low frequency power source electrically coupled to either the first or second electrode to supply a second RF signal. The first RF signal is pulsed on and off so as to enhance electron loss in the chamber.