| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate. |
| 申请公布号 |
US7428040(B2) |
申请公布日期 |
2008.09.23 |
| 申请号 |
US20070717174 |
申请日期 |
2007.03.13 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GUI CHENG-QUN;BLEEKER ARNO JAN;DE JAGER PIETER WILLEM HERMAN;SYTSMA JOOST |
| 分类号 |
G03B27/54;G03F7/20;H01L21/027 |
主分类号 |
G03B27/54 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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