| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for vaporizing a material solution, with which a vaporizer for MOCVD is obtained which eliminates a phenomenon that thin-film materials are adhered to a portion of the vaporizer near and around a spout thereof. SOLUTION: A carrier gas/small amount oxidizing gas supply part 11 supplies a carrier gas, which is supplied through an internally formed gas passage and which contains a material solution, to a vaporization part; a bubble prevention/material solution supply part 12 supplies a material for preventing generation of bubbles of the carrier gas containing the material solution, and the material solution, into the carrier gas; a solvent vaporization restricting/cooling system 13 restricts the vaporization of a solvent; and a swirl flow preventing gas supply part 14 supplies a gas for preventing the occurrence of swirl flow near a gas outlet of the vaporization part. An atomizing part 15 causes the carrier gas, which contains the material solution and which is ejected from the vaporizer 20, to be formed into a finely atomized state; and a complete vaporization oriented high performance vaporization tube 16 completely vaporizes the carrier gas ejected from the vaporizer 20 and containing the material solution. This enables long-term usage without clogging and the like, and enables stable material supply to a reaction part. COPYRIGHT: (C)2008,JPO&INPIT
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