发明名称 |
SUBSTRATE WASHING BRUSH |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate washing brush which removes foreign matter by one brush even if there is irregularity in the shape of the foreign matter and easily separates the removed foreign matter from the brush. SOLUTION: The bristles 20 of the washing brush of the substrate washing brush 100 are flocked on a flocking surface 30 with a predetermined angle and the substrate washing brush 100 is mounted on an ultrasonic substrate washing apparatus 200 so the bristle tip parts of the washing brush come into contact with the surface 30 of a substrate 35 to be washed and the first direction line showing the feed direction of the substrate 35 to be washed and the second direction line showing the flocking direction of the bristles 20 of the washing brush flocked at the predetermined angle form an acute angleα2. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008212770(A) |
申请公布日期 |
2008.09.18 |
申请号 |
JP20070049513 |
申请日期 |
2007.02.28 |
申请人 |
SHIMADA PHYS & CHEM IND CO LTD |
发明人 |
KATAOKA TATSUO;NARUOKA MASAAKI;KITAGAWA KENICHI;NAGASE AKIRA;HORIIKE HIDEO;YONEDA HISAFUMI |
分类号 |
B08B1/02;A46B9/02;B08B1/04;B08B3/12 |
主分类号 |
B08B1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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