发明名称 PATTERN FOR MEASURING AMOUNT OF POSITIONAL MISALIGNMENT AND MEASURING METHOD, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the problem wherein precision in measurement is low when measuring the amount of positional misalignment in a conventional measuring method. SOLUTION: Respective patterns 10a, 10b, 10c, 10d for measurement are used for a method of measuring the relative amount of positional misalignment (the amount of positional misalignment) between wiring and a conductor plug by applying voltage between a pad 22 (first terminal) and a pad 24 (second terminal). The patterns have wiring 12 (first wiring) connected to the pad 22, a via plug 14 (first conductor plug) connected to the wiring 12, and wiring 16 (second wiring) that is provided in the same layer as the wiring 12 while an insulating film (not shown) is sandwiched and the wiring 16 is provided opposite to the wiring 12, and is connected to the pad 24. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008218921(A) 申请公布日期 2008.09.18
申请号 JP20070057780 申请日期 2007.03.07
申请人 NEC ELECTRONICS CORP 发明人 OSHIDA DAISUKE
分类号 H01L21/66;H01L21/3205;H01L21/822;H01L23/52;H01L27/04 主分类号 H01L21/66
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