| 发明名称 |
Gate dielectric structures, organic semiconductors, thin film transistors and related methods |
| 摘要 |
Gate dielectric structures comprising an organic polymeric component, and organic semiconductor components, as can be used to fabricate thin film transistor devices.
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| 申请公布号 |
US2008224127(A1) |
申请公布日期 |
2008.09.18 |
| 申请号 |
US20070895000 |
申请日期 |
2007.08.22 |
| 申请人 |
MARKS TOBIN J;FACCHETTI ANTONIO;YOON MYUNG-HAN |
发明人 |
MARKS TOBIN J.;FACCHETTI ANTONIO;YOON MYUNG-HAN |
| 分类号 |
H01L51/40;H01L51/00 |
主分类号 |
H01L51/40 |
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