发明名称 HIGH MOBILITY POWER METAL-OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTORS
摘要 <p>High mobility P-channel power metal oxide semiconductor field effect transistors. In accordance with an embodiment of the present invention, a power MOSFET is fabricated such that the holes flow in an inversion/accumulation channel, which is along the (110) crystalline plane, or equivalents, and the current flow is in the [110] direction, or equivalents, when a negative potential is applied to the gate with respect to the source. The enhanced channel mobility of holes leads to a reduction of the channel portion of the on-state resistance, thereby advantageously reducing total ''on'' resistance of the device.</p>
申请公布号 KR20080083151(A) 申请公布日期 2008.09.16
申请号 KR20087017039 申请日期 2006.12.22
申请人 VISHAY-SILICONIX 发明人 PATTANAYAK DEVA;CHEN KUO IN;CHAU THE TU
分类号 H01L21/336 主分类号 H01L21/336
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