| 摘要 |
A substrate processing apparatus and a method for opening and closing a passage formed in a process chamber thereof, and a substrate processing method thereof are provided to enhance performance by modifying an internal space structure thereof. A process chamber includes an internal space for processing a substrate. A passage is formed at one side of the process chamber. A substrate comes in and out the chamber through the passage. A door unit opens and closes a door. The door unit includes an opening/closing member to be moved to an opening position and a closing position. The door unit opens and closed the door while the opening/closing member is moved to the opening position and the closing position, respectively. The opening/closing member includes an inner door(322), an outer door(324), and a connective member(326).
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