| 摘要 |
An object of the invention is to prevent short circuit at a side surface of a semiconductor device in the method for producing semiconductor devices including a laser lift-off step. The production method of the invention includes forming, on a sapphire substrate, a group III nitride semiconductor layer containing a plurality of semiconductor devices isolated from one another by a groove which reaches the substrate; forming a protective film for preventing short circuit on the top surface and side surfaces of the semiconductor layer and on the top surface of the sapphire substrate; forming a resin layer in the groove; bonding the semiconductor layer to a support substrate via a low-melting-point metal layer; and removing the sapphire substrate through the laser lift-off process. The resin layer functions as a support for the protective film, to thereby prevent cracking or chipping of the protective film. As a result, current leakage or short circuit, which would otherwise be caused by cracking or chipping of the protective film, can be prevented.
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