发明名称 ELECTROOPTICAL DEVICE AND ITS MANUFACTURING METHOD, AND ELECTRONIC EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To increase flatness of a substrate surface in an electrooptical device such as a liquid crystal device. SOLUTION: The electrooptical device includes on a substrate: a storage capacitor (70) which is provided in a non-opening region (R2) and formed by stacking a lower electrode (71), a dielectric film (75), and an upper electrode (301), the lower electrode having a lower electrode main body portion (71a) overlapping the upper electrode and a lower electrode extension portion (71b) extended from a portion (71a1) of the lower electrode main body portion not to overlap the upper electrode; and a spacer insulating film (49) disposed on an upper layer side of a ground surface (41s) of the lower electrode and on a lower layer side of the upper electrode and formed in a region including the boundary (Bd) between the lower electrode main body portion and lower electrode extension portion not to overlap an other portion (71a2) of the lower electrode main body portion. Further, the electrooptical device has a dummy pattern (910) which is provided in an opening region (R1) and made of the same film with a spacer insulating film. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008203394(A) 申请公布日期 2008.09.04
申请号 JP20070037446 申请日期 2007.02.19
申请人 SEIKO EPSON CORP 发明人 OYAMADA SUSUMU
分类号 G09F9/30;G02F1/1368 主分类号 G09F9/30
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