<p>A distortion measurement and inspection system is presented. In one embodiment, a vision system is implemented. The vision system performs dual focal plane imaging where simultaneous imaging of two focal planes is simultaneously performed on a sample substrate and a reference substrate to determine distortion. In addition, a highly reflective background is implemented to provide for more resolution during distortion measurement.</p>
申请公布号
WO2008106120(A1)
申请公布日期
2008.09.04
申请号
WO2008US02502
申请日期
2008.02.26
申请人
CORNING INCORPORATED;BERG, DAVID;GOLLIER, JACQUES;GOODMAN, DOUGLAS S;USTANIK, CORREY R
发明人
BERG, DAVID;GOLLIER, JACQUES;GOODMAN, DOUGLAS S;USTANIK, CORREY R