| 摘要 |
PROBLEM TO BE SOLVED: To provide vacuum treatment equipment easily adjusting film-formation characteristics and inhibiting the generation of the difference of the film-formation characteristics in each film-formation chamber while reducing equipment cost and a method for forming a film by using the vacuum treatment equipment. SOLUTION: The vacuum treatment equipment has a plurality of discharge electrodes 3a to 3h supplying both end sections 53 with a high-frequency power from a power supply section 17a and forming a plasma among a substrate 8 and the discharge electrodes and a plurality of matching apparatuses 3at to 3ht adjusting the phases and amplitudes of the high-frequency power supplied to a plurality of the discharge electrodes 3a to 3h in each of both end sections 53. The impedances of a plurality of the matching apparatuses 3at to 3ht are set at an approximately the same value, and the values of the impedances are set at a value approximately minimizing the reflecting power to the power supply section 17a in one discharge electrode in a plurality of the discharge electrodes 3a to 3h. COPYRIGHT: (C)2008,JPO&INPIT |
